American Scientist Elsa Reichmanis Receives China's Top Science Award, Advocates for Collaboration
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- American materials scientist Elsa Reichmanis, a pioneer in semiconductor manufacturing, received China’s International Science and Technology Cooperation Award.
- She emphasized that scientific collaboration should transcend rivalry, describing science as a universal language benefiting all society.
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Warum es wichtig ist
Elsa Reichmanis is an American materials scientist known for her pioneering work on chemically amplified photoresists, which enabled the nanoscale semiconductor industry. Her contributions made it commercially viable to pack millions of transistors onto single silicon chips.
American materials scientist Elsa Reichmanis, whose pioneering work helped lay part of the foundation for modern semiconductor manufacturing, said scientific collaboration should transcend rivalry after receiving one of China’s highest honours for foreign experts, describing science as “a universal language” that benefits all of society.
Reichmanis, a professor of chemical engineering in Lehigh University’s department of chemical and biomolecular engineering and the director of its Institute for Functional Materials and Devices, was one of nine recipients of the China International Science and Technology Cooperation Award in early July.
The award recognises exceptional contributions to scientific exchanges and collaboration with Chinese researchers.
Reichmanis is best known for her groundbreaking work on chemically amplified photoresists – light-sensitive materials used to etch microscopic circuits onto silicon wafers.
Her chemistry made it commercially viable to pack tens of millions of transistors – or more – onto a single silicon chip, laying the groundwork for the nanoscale semiconductor industry.
“I was shocked,” said the 72-year-old Reichmanis, an accomplished US chemistry and materials scientist, in an interview with the South China Morning Post.
