Used in processes below 7nm! Shanghai startups display EUV prototypes at China Industry Fair

At the China International Industry Fair being held in Shanghai, China, a Shanghai start-up manufacturer low-key displayed a prototype of extreme ultraviolet (EUV) lithography equipment required for the most advanced process wafers below 7 nanometers.

The United States imposes advanced technology export controls on China, and China takes government leadership to break through the restrictions. Among them, after the United States blocked ASML of the Netherlands from exporting EUV lithography equipment to China, China developed its own deep ultraviolet (DUV) lithography equipment to enhance the competitiveness of advanced processes.

As for the EUV required to produce the most advanced chips, ASML still has a monopoly on the market. Therefore, after it was reported that China was developing and producing EUV by itself, the progress of research and development has been a topic of concern to the outside world.

The large-scale EUV prototype unveiled at the CIIF was not placed in a popular exhibition hall related to integrated circuits, but was placed in a low-key Shanghai exclusive exhibition area in the Innovation and Technology Museum. When reporters asked for details, the on-site personnel refused to accept interviews.

According to a written introduction provided by the developer Landau Technology at the exhibition site, Landau Technology will set up a Landau light source project in 2024 to focus on the core technology of semiconductor manufacturing EUV lithography equipment light source.

Compared with the low-key product explanations, since the Innovation and Technology Museum is next to the exhibition hall where various Chinese universities display research results, once a young student stops in, the staff will immediately hand over a recruitment document including full-time and internship positions. The staff said, "We are a new company and we are in great need of talents."